Clean Technology 2009

Thin film solar cell based on microcrystalline nanostructure silicon grown in low temperature condition

Y.B. Chung, J.S. Lim, J.K. Kim, N.M. Hwang, H. Kim, Y.J. Park
Seoul National University, KR

Keywords: HWCVD, microcrystalline silicon, solar cell, photoconductivity


High quality microcrystalline silicon thin film grown by Hot-Wire Chemical Vapor Deposition(HWCVD) and subsequently manufactured solar cells are presented. Intrinsic layer photoconductivity data is provided for one of the film quality measures, and the result is about 3 times higher than previously reported best record. We propose two-step microcrystalline silicon film growth mechanism, in which silicon nanoparticles are formed in the gas phase and subsequently incorporated into a solid film on glass substrates.
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